Structure and growth mechanism of CuO plates obtained by microwave-hydrothermal without surfactants

被引：113

作者：

Moura, A. P. ^{[2
]}

Cavalcante, L. S. ^{[1
]}

Sczancoski, J. C. ^{[2
]}

Stroppa, D. G. ^{[3
]}

Paris, E. C. ^{[2
]}

Ramirez, A. J. ^{[3
]}

Varela, J. A. ^{[1
]}

Longo, E. ^{[1
]}

机构：

[1] Univ Estadual Paulista, LIEC IQ, BR-14801907 Araraquara, SP, Brazil

[2] Univ Fed Sao Carlos, LIEC DQ, BR-13565905 Sao Carlos, SP, Brazil

[3] Lab Nacl Luz Sincrotron, BR-13083970 Campinas, SP, Brazil

来源：

ADVANCED POWDER TECHNOLOGY | 2010年 / 21卷 / 02期

基金：

巴西圣保罗研究基金会;

关键词：

CuO; Plates; Rietveld refinement; Microscopy; Crystal growth; ELECTRODE MATERIALS; CUPRIC OXIDE; POWDER DIFFRACTION; ASSISTED SYNTHESIS; NANOSTRUCTURES; NANOPARTICLES; CU2O; OXIDATION; ROUTE; AGGREGATION;

D O I：

10.1016/j.apt.2009.11.007

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

CuO plates were obtained by microwave-hydrothermal processing at 130 C for 30 min without any surfactant. X-ray diffraction, Rietveld refinement and selected area electron diffraction showed that the CuO plates present a monoclinic structure without secondary phases. The nitrogen adsorption isotherm measurements revealed a specific surface area of approximately 30 m(2)/g. Field-emission gun scanning electron microscopy and transmission electron microscope micrographs indicated that the growth process of these plates was through Ostwald ripening and aggregation of plates surface by Van der Waals forces along to the two [100] and [010] directions. (C) 2009 The Society of Powder Technology Japan. Published by Elsevier B.V. and The Society of Powder Technology Japan. All rights reserved.

引用

页码：197 / 202

页数：6

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