Synthesis and characterization of VO2 thin films on piezoelectric substrates

Polycrystalline VO2 thin films synthesized on two piezoelectric substrates (AT-cut quartz and GaN/AlGaN/GaN/ Si) using low pressure direct oxidation technique have been characterized and compared to VO2 grown on traditional non-piezoelectric substrates sapphire and SiO2/Si. X-ray diffraction and atomic force microscopy characterization performed on the as grown films confirmed high quality of the VO2 films grown on both the piezoelectric and non-piezoelectric substrates. Changes in material properties associated with the semiconductor metal transition (SMT) of the VO2 films were investigated through resistivity and transmitted optical power changes measured across the SMT. It was observed that the VO2 films grown on the piezoelectric substrates are of high quality, and their electrical and optical properties changes are quite comparable to the best reported values on films synthesized on various substrates using different synthesis processes.