共 50 条
- [1] Characteristics of hard DLC film formed by gas cluster ion beam assisted deposition MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS, 2001, : 112 - 113
- [2] DLC film formation by Ar cluster ion beam assisted deposition APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 2001, 576 : 963 - 966
- [3] Optical thin film formation by gas-cluster ion beam assisted deposition APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 1999, 475 : 409 - 412
- [4] Fluoride thin film formation with low optical absorption by gas cluster ion beam assisted deposition NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2007, 261 (1-2): : 656 - 659
- [5] Titanium-dioxide film formation using gas cluster ion beam assisted deposition technique NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2003, 206 : 866 - 869
- [6] Ion beam sputtering deposition of DLC film assisted by electron beam excited plasma NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY, 2000, 10 (01): : 35 - 35
- [7] Oxide film deposition by gas-cluster ion assisted deposition APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 1999, 475 : 425 - 428
- [8] MgF2 and LaF3 thin film formation with gas cluster ion beam assisted deposition SURFACE & COATINGS TECHNOLOGY, 2007, 201 (19-20): : 8620 - 8623
- [9] Influence of residual Ar+ in Ar cluster ion beam for DLC film formation NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2003, 206 : 884 - 888
- [10] Study of flux ratio of C60 to Ar cluster ion for hard DLC film deposition APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 2003, 680 : 719 - 722