Ab initio studies of ClOx reactions.: 3.: Kinetics and mechanism for the OH plus OClO reaction

被引:24
|
作者
Xu, ZF [1 ]
Zhu, RS [1 ]
Lin, MC [1 ]
机构
[1] Emory Univ, Dept Chem, Atlanta, GA 30322 USA
来源
JOURNAL OF PHYSICAL CHEMISTRY A | 2003年 / 107卷 / 07期
关键词
D O I
10.1021/jp021183+
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The mechanism for the OH + OClO reaction on the singlet and triplet surfaces and its rate constants for formation of various products have been investigated by means of ab initio molecular orbital theory and variational RRKM theory calculations. The geometric parameters of stationary points were optimized at the B3LYP level of theory with the 6-311G(d,p) and 6-311+G(3df,2p) basis sets, and the potential energy surfaces were evaluated at the G2M(CC2)//B3LYP/6-311+G(3df,2p) level of theory. Three main product channels, all located on the singlet PES, have been identified: (1) HOO + ClO, (2) HOCl + O-1(2), and (3) HOClO2, the association product. The predicted results show that the rate constants for channels 1 and 2 are pressure-independent up to 1000 atm and that for channel 3 is strongly pressure dependent. Below 1000 K, all rate constants were found to vary negatively with temperature. The individual and total rate constants in the temperature range from 200 to 1000 K at 1 Torr He pressure can be represented by k(1)(T) = 1.22 x 10(-22)T(2.75) exp(1682/T), k(2)(T) = 5.47 x 10(-20)T(2.07) exp(2064/T), k(3)(T) = 1.37 x 10(4)T(-6.61) exp(-536/T) (200-500 K) and 4.99 x 10(54)T(-22.36) exp(-9807/T) (500-1000 K), and k(tot)(T) = 1.78 x 10(-20)T(2.25) exp(2100/T) in units of cm(3) molecule(-1) s(-1). The predicted rate constant, with the HOCl + O-1(2) as the major products in the 300-500 K range, agrees well with available experimental data obtained at 1 Torr He pressure. The high- and low- pressure limits of k(3) can be effectively given by k(3)(infinity)(T) = 3.24 x 10(-11) T-0.28 exp(- 18/T) cm(3) molecule(-1) s(-1) in 200-2500 K and k(3)degrees(T) = 1.28 x 10(-13)T(-6.36) exp(-635/T) for 200-800 K, 7.37 x 10(84)T(-36.02) exp(-22134/T) for 800-1000 K, and 2.91 x 10(-13)T(-8.42) exp(11500/T) for 1000-2500 K in units of cm(6) molecule(-2) s(-1) with N-2 as the third body.
引用
收藏
页码:1040 / 1049
页数:10
相关论文
共 50 条
  • [1] Ab initio studies of ClOx reactions.: I.: Kinetics and mechanism for the OH plus ClO reaction
    Zhu, RS
    Xu, ZF
    Lin, MC
    JOURNAL OF CHEMICAL PHYSICS, 2002, 116 (17): : 7452 - 7460
  • [2] Ab initio studies of ClOx reactions.: VII.: Isomers of Cl2O3 and their roles in the ClO plus OClO reaction
    Zhu, RS
    Lin, MC
    JOURNAL OF CHEMICAL PHYSICS, 2003, 118 (19): : 8645 - 8655
  • [3] Ab initio studies of ClOx reactions.: IV.: Kinetics and mechanism for the self-reaction of ClO radicals
    Zhu, RS
    Lin, MC
    JOURNAL OF CHEMICAL PHYSICS, 2003, 118 (09): : 4094 - 4106
  • [4] Ab initio studies of ClOx reactions.: 2.: Unimolecular decomposition of s-ClO3 and the bimolecular O+OClO reaction
    Zhu, RS
    Lin, MC
    JOURNAL OF PHYSICAL CHEMISTRY A, 2002, 106 (36): : 8386 - 8390
  • [5] Ab initio studies of ClOx reactions.: IX.: Combination and disproportionation reactions of ClO and s-ClO3 radicals
    Xu, ZF
    Lin, MC
    JOURNAL OF CHEMICAL PHYSICS, 2003, 119 (17): : 8897 - 8904
  • [6] Ab initio chemical kinetics for the HCCO plus OH reaction
    Mai, Tam V. -T.
    Raghunath, P.
    Le, Xuan T.
    Huynh, Lam K.
    Nam, Pham-Cam
    Lin, M. C.
    CHEMICAL PHYSICS LETTERS, 2014, 592 : 175 - 181
  • [7] Ab initio calculation on the mechanism for the reaction CH3+OClO
    Zhou, XG
    Li, J
    Wang, Z
    Yu, SQ
    Ma, XX
    ACTA CHIMICA SINICA, 2001, 59 (03) : 366 - 370
  • [8] Ab initio chemical kinetics for the OH plus HNCN reaction
    Xu, Shucheng
    Lin, M. C.
    JOURNAL OF PHYSICAL CHEMISTRY A, 2007, 111 (29): : 6730 - 6740
  • [9] Ab initio Kinetics of OH plus Fulvenallene
    Mai, Tam V. -T.
    Phung, Quan
    Pham-Tran, Nguyen-Nguyen
    Nguyen, Loc T.
    Tran, Lan N.
    Huynh, Lam K.
    COMBUSTION AND FLAME, 2025, 273
  • [10] Ab initio studies of ClOx reactions.: VIII.: Isomerization and decomposition of ClO2 radicals and related bimolecular processes
    Zhu, RS
    Lin, MC
    JOURNAL OF CHEMICAL PHYSICS, 2003, 119 (04): : 2075 - 2082