High performance MoS2 TFT using graphene contact first process

被引:5
|
作者
Chien, Chih-Shiang Chang [1 ]
Chang, Hsun-Ming [2 ]
Lee, Wei-Ta [1 ]
Tang, Ming-Ru [1 ]
Wu, Chao-Hsin [1 ,2 ]
Lee, Si-Chen [1 ,2 ]
机构
[1] Natl Taiwan Univ, Grad Inst Elect Engn, Dept Elect Engn, Taipei 10617, Taiwan
[2] Natl Taiwan Univ, Grad Inst Photon & Optoelect, Dept Elect Engn, Taipei 10617, Taiwan
关键词
TRANSISTORS; CHANNEL;
D O I
10.1063/1.4996136
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
An ohmic contact of graphene/MoS2 heterostructure is determined by using ultraviolet photoelectron spectroscopy (UPS). Since graphene shows a great potential to replace metal contact, a direct comparison of Cr/Au contact and graphene contact on the MoS2 thin film transistor (TFT) is made. Different from metal contacts, the work function of graphene can be modulated. As a result, the subthreshold swing can be improved. And when V-g < V-FB, the intrinsic graphene changes into p-type, so graphene contact can achieve lower off current by lowering the Fermi level. To further improve the performance of MoS2 TFT, a new method using graphene contact first and MoS2 layer last process that can avoid PMMA residue and high processing temperature is applied. MoS2 TFT using this method shows on/off current ratio up to 6x10(6) order of magnitude, high mobility of 116 cm(2)/V-sec, and subthreshold swing of only 0.515 V/dec. (C) 2017 Author(s).
引用
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页数:6
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