Modeling of lightly-doped drain and source contact with boron and nitrogen in graphene nanoribbon

被引:4
|
作者
Wong, Kien Liong [1 ]
Tan, Beng Rui [1 ]
Chuan, Mu Wen [1 ]
Hamzah, Afiq [1 ]
Rusli, Shahrizal [1 ]
Alias, Nurul Ezaila [1 ]
Sultan, Suhana Mohamed [1 ]
Lim, Cheng Siong [1 ]
Tan, Michael Loong Peng [1 ]
机构
[1] Univ Teknol Malaysia, Fac Engn, Sch Elect Engn, Skudai 81310, Johor, Malaysia
关键词
graphene nanoribbon (GNR); lightly-doped contact; non-equilibrium greeds function (NEGF); tight-binding; band structure; density of states (DOS); SIMULATION;
D O I
10.1016/j.cjph.2019.09.026
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Graphene, a monolayer carbon atoms arranged in hexagonal honeycomb lattice possesses impressive electronic properties. It is utilized as channel, source and drain contact in graphene nanoribbon field-effect transistor (GNRFET). Zigzag graphene nanoribbon (ZGNR) is used as semi-metallic drain and source terminal to a pristine armchair graphene nanoribbon (AGNR) that acts as a semiconducting channel. In addition, a single dopant, either nitrogen or boron is added to create lightly-doped drain and source contact. The electronic properties of graphene nanoribbon (GNR) with lightly-doped drain and source contacts are obtained from tight-binding approach. With self-energy matrices, the lightly-doped contacts Hamiltonian matrices are combined with the pristine channel Hamiltonian matrix. The density of states (DOS) are simulated based on the non-equilibrium Greeds Function (NEGF) formalism. Our findings are then compared with published research work. Furthermore, it is demonstrated that the DOS of the overall GNR structure still retain a small band gap and possess semiconducting properties when the channel is connected to semi-metallic contact at the drain and source terminal.
引用
收藏
页码:258 / 273
页数:16
相关论文
共 50 条
  • [1] Modeling of lightly doped drain and source graphene nanoribbon field effect transistors
    Saremi, Mehdi
    Saremi, Maryam
    Niazi, Hamid
    Goharrizi, Arash Yazdanpanah
    SUPERLATTICES AND MICROSTRUCTURES, 2013, 60 : 67 - 72
  • [2] COMPARISON OF CHARACTERISTICS OF LIGHTLY-DOPED DRAIN MOSFETS
    LIU, BD
    CHIEN, IK
    SOLID-STATE ELECTRONICS, 1990, 33 (01) : 143 - 144
  • [3] ASYMMETRICAL CHARACTERISTICS OF LIGHTLY-DOPED DRAIN MOSFETS
    LIU, BD
    CHIEN, IK
    INTERNATIONAL JOURNAL OF ELECTRONICS, 1991, 70 (01) : 101 - 109
  • [4] CHARACTERISTICS OF PROFILED LIGHTLY-DOPED DRAIN MOSFETS
    LIU, BD
    CHIEN, IK
    INTERNATIONAL JOURNAL OF ELECTRONICS, 1992, 73 (04) : 711 - 716
  • [5] Graphene nanoribbon tunnel field effect transistor with lightly doped drain: Numerical simulations
    Ghoreishi, Seyed Saleh
    Saghafi, Kamyar
    Yousefi, Reza
    Moravvej-Farshi, Mohammad Kazem
    SUPERLATTICES AND MICROSTRUCTURES, 2014, 75 : 245 - 256
  • [6] Real space simulation of graphene nanoribbon field-effect transistor with double-lightly doped source and drain regions
    Rostami, Amir
    Fathi, Davood
    2017 25TH IRANIAN CONFERENCE ON ELECTRICAL ENGINEERING (ICEE), 2017, : 253 - 258
  • [8] Numerical study on the performance metrics of lightly doped drain and source graphene nanoribbon field effect transistors with double-material-gate
    Wang, Wei
    Yang, Xiao
    Li, Na
    Zhang, Lu
    Zhang, Ting
    Yue, Gongshu
    SUPERLATTICES AND MICROSTRUCTURES, 2013, 64 : 227 - 236
  • [9] Analytical modeling of asymmetric HALO-doped surrounding-gate MOSFET with gate overlapped lightly-doped drain
    Li Cong
    Zhuang Yi-Qi
    Han Ru
    Zhang Li
    Bao Jun-Lin
    ACTA PHYSICA SINICA, 2012, 61 (07)
  • [10] CHARGE-PUMPING CHARACTERISTICS OF VIRGIN AND STRESSED LIGHTLY-DOPED DRAIN MOSFETS
    HABAS, P
    SOLID-STATE ELECTRONICS, 1995, 38 (04) : 891 - 904