Empirical metal-oxide RRAM device endurance and retention model for deep learning simulations

被引:10
|
作者
Lammie, Corey [1 ]
Rahimi Azghadi, Mostafa [1 ]
Ielmini, Daniele [2 ]
机构
[1] James Cook Univ, Coll Sci & Engn, Townsville, Qld 4814, Australia
[2] Politecn Milan, I-20133 Milan, Italy
关键词
metal-oxide RRAM; deep learning; endurance; retention; simulation; IMPACT;
D O I
10.1088/1361-6641/abf29d
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Memristive devices including resistive random access memory (RRAM) cells are promising nanoscale low-power components projected to facilitate significant improvement in power and speed of Deep Learning (DL) accelerators, if structured in crossbar architectures. However, these devices possess non-ideal endurance and retention properties, which should be modeled efficiently. In this paper, we propose a novel generalized empirical metal-oxide RRAM endurance and retention model for use in large-scale DL simulations. To the best of our knowledge, the proposed model is the first to unify retention-endurance modeling while taking into account time, energy, SET-RESET cycles, device size, and temperature. We compare the model to state-of-the-art and demonstrate its versatility by applying it to experimental data from fabricated devices. Furthermore, we use the model for CIFAR-10 dataset classification using a large-scale deep memristive neural network (DMNN) implementing the MobileNetV2 architecture. Our results show that, even when ignoring other device non-idealities, retention and endurance losses significantly affect the performance of DL networks. Our proposed model and its DL simulations are made publicly available.
引用
收藏
页数:7
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