Effect of purge gas on the reliability of a 266 nm continuous-wave solid-state laser

被引：0
|
作者：
Wada, H [1 ]
Oka, M [1 ]
Tatsuki, K [1 ]
Saito, M [1 ]
Kubota, S [1 ]
机构：
[1] SONY Co, Atsugi, Kanagawa 2430014, Japan
来源：
IEICE TRANSACTIONS ON ELECTRONICS | 2004年 / E87C卷 / 12期
关键词：
UV laser; reliability; purge gas; scattering;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The reliability of a 266 nm cw (continuous-wave) solid-state laser under the influence of purge gas was considered. Scatterers on a mirror during long-term operation were ammonium sulfate (NH4SO4). The synthesis of ammonium sulfate was related to the amount of water in the purge gas. UV power decreased by scatterers when the purge was not conducted.
引用
收藏
页码：2186 / 2188
页数：3
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