Ultraviolet poling of pure fused silica by high-intensity femtosecond radiation

被引：16
|
作者：
Corbari, C
Kazansky, PG
Slattery, SA
Nikogosyan, DN [1 ]
机构：
[1] Univ Southampton, Optoelect Res Ctr, Southampton SO9 5NH, Hants, England
[2] Natl Univ Ireland Univ Coll Cork, Dept Phys, Cork, Ireland
来源：
APPLIED PHYSICS LETTERS | 2005年 / 86卷 / 07期
基金：
爱尔兰科学基金会;
关键词：
D O I：
10.1063/1.1868075
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We demonstrate UV poling of a pure fused silica sample by applying to it an electric field of 200 kV/cm and irradiating it with high-intensity (similar to40 GW/cm(2)) femtosecond (220 fs) laser pulses at 264 nm. (C) 2005 American Institute of Physics.
引用
收藏
页码：1 / 3
页数：3
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