ATR-FTIR and nanoindentation measurements of PMDA-ODA polyimide film under different curing temperature

被引：19

作者：

Lee, Shih-Chin

Tai, Fong-Cheng ^{[1
]}

Wei, Che-Hung

Yu, Jui-I

机构：

[1] Natl Cheng Kung Univ, Dept Mat Sci & Engn, Tainan 701, Taiwan

[2] TATUNG Univ, Dept Engn Mech, Taipei 104, Taiwan

[3] Natl Sun Yat Sen Univ, Inst Sci Mat, Kaohsiung 804, Taiwan

来源：

MATERIALS TRANSACTIONS | 2007年 / 48卷 / 06期

关键词：

curing temperature; ATR-FTIR (Attenuated total reflectance-Fourier transform infrared spectrometer); micro-hardness; nanoelastic modulus; nano-hardness;

D O I：

10.2320/matertrans.MER2007045

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

ATR-FTIR apparatus is used to measure the curing rate of PMDA-ODA polyimide film in order to avoid sinusoidal interference fringe. From the corrected height method, the curing rate is found to have positive correlative trend with the curing temperature. It was shown that the curing rate under 300 degrees C is 92.1% than that under 400 degrees C for one hour. The curing degree related to the mechanical properties was further demonstrated by nanoindentation. The results show that the higher the curing rate the higher the nano-hardness and nano-modulus due to the thermal imidization of polyimide characteristic. The nano-hardness ratio of curing degree at 300 degrees C over curing degree at 400 degrees C is 0.89, while the nano-modulus of which is 0.95.

引用

页码：1554 / 1557

页数：4

共 12 条

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