Theoretical analysis of photoacoustic thermoelastic response in two-layered wafer

被引：0
|
作者：
Shendeleva, ML [1 ]
机构：
[1] NATL ACAD SCI UKRAINE,INST PHYS,LAB PHOTOACOUST & OPT,UA-252650 KIEV 22,UKRAINE
来源：
9TH INTERNATIONAL CONFERENCE ON PHOTOACOUSTIC AND PHOTOTHERMAL PHENOMENA, CONFERENCE DIGEST | 1996年
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D O I：
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中图分类号：
O42 [声学];
学科分类号：
070206 ; 082403 ;
摘要：
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页码：474 / 475
页数：2
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