Uncertainty analysis for the determination of B4C optical constants by angle-dependent reflectance measurement for 40 nm to 80 nm wavelength

被引：9

作者：

Gottwald, Alexander ^{[1
]}

Wiese, Karl ^{[1
]}

Kroth, Udo ^{[1
]}

Richter, Mathias ^{[1
]}

机构：

[1] Phys Tech Bundesanstalt, Abbestr 2-12, D-10587 Berlin, Germany

来源：

APPLIED OPTICS | 2017年 / 56卷 / 20期

关键词：

THIN-FILMS; CARBIDE; PHOTOABSORPTION; SCATTERING; RADIATION; STABILITY; MEDIA;

D O I：

10.1364/AO.56.005768

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The index of refraction and the extinction coefficient for thin films of boron carbide were determined by angle-dependent reflectance measurements in the vacuum-ultraviolet spectral range. The numerical approximation was done using transfer-matrix formalism in combination with particle swarm optimization for the fitting algorithm. By this, not only for the reflectance measurement but also for the numerical approximation, a profound uncertainty budget was developed. This includes possible effects due to contamination and intermediate layers. Thus it was possible to establish a method for determination of n and k with reliable and highly traceable uncertainties, and to significantly improve the consistency of existing data required for current developments in optical technology. (C) 2017 Optical Society of America

引用

页码：5768 / 5774

页数：7

共 10 条

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