Effects of focused-ion-beam irradiation on perpendicular write head performance

被引:4
|
作者
Park, CM
Bain, JA
Clinton, TW
van der Heijden, PAA
机构
[1] Carnegie Mellon Univ, Ctr Data Storage Syst, Dept Elect & Comp Engn, Pittsburgh, PA 15213 USA
[2] Seagate Res, Pittsburgh, PA 15203 USA
关键词
D O I
10.1063/1.1557652
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effects of focused-ion-beam (FIB) irradiation on writer performance were examined on a perpendicular recording system. The entire top pole was irradiated by FIB with ion doses from 0 to 300 pC/mum(2). PW50 and signal to noise ratio (SNR) were characterized using a spin stand before and after FIB irradiation. It was found that there is degradation of PW50 and SNR due to FIB irradiation. At the maximum dose (300 pC/mum(2)), PW50 increased by 33 nm (>30%) and SNR decreased by 5 dB (>25%). The degradation was attributed to the physical pole tip recession and the formation of a magnetic dead layer. The thickness of the magnetic dead layer was estimated by analyzing the write spacing loss. Using atomic force microscopy and stage current change monitored during FIB process, it was found that the entire 4-nm protective carbon layer was etched away with a dose of 25 pC/mum(2). This result implies that the degradation with ion doses <25 pC/mum(2) is exclusively due to damage to the magnetic layer at the pole surface due to Ga implantation. It was found that our experimental results are consistent with the conventional write spacing loss behavior. (C) 2003 American Institute of Physics.
引用
收藏
页码:6459 / 6461
页数:3
相关论文
共 50 条
  • [1] Effects of focused-ion-beam irradiation on perpendicular write head performance
    Park, Chang-Min
    Bain, James A.
    Clinton, Thomas W.
    Van der Heijden, Paul A. A.
    Journal of Applied Physics, 2003, 93 (10 2): : 6459 - 6461
  • [2] Asymmetric focused-ion-beam trimming of longitudinal and perpendicular write heads
    Clinton, TW
    Zhang, ZZ
    Feng, YC
    van der Heijden, PAA
    IEEE TRANSACTIONS ON MAGNETICS, 2003, 39 (05) : 2408 - 2410
  • [3] Fabrication and characterization of focused-ion-beam trimmed write heads for perpendicular magnetic recording
    Clinton, TW
    van der Heijden, PAA
    Karns, DC
    Yu, J
    Park, CM
    Batra, S
    JOURNAL OF APPLIED PHYSICS, 2002, 91 (10) : 6836 - 6838
  • [4] Formation of oriented nanocrystals in an amorphous alloy by focused-ion-beam irradiation
    Tarumi, R
    Takashima, K
    Higo, Y
    APPLIED PHYSICS LETTERS, 2002, 81 (24) : 4610 - 4612
  • [5] Nanopatterning of a thin ferromagnetic CoFe film by focused-ion-beam irradiation
    McGrouther, D
    Chapman, JN
    APPLIED PHYSICS LETTERS, 2005, 87 (02)
  • [6] Patterning of nanomembranes with a Focused-Ion-Beam
    Matovic, J.
    Kettle, J.
    Brousseau, E.
    Adamovic, N.
    2008 26TH INTERNATIONAL CONFERENCE ON MICROELECTRONICS, VOLS 1 AND 2, PROCEEDINGS, 2008, : 103 - +
  • [7] Focused-ion-beam processing for photonics
    de Ridder, Rene M.
    Hopman, Wico C. L.
    Ay, Feridun
    ICTON 2007: PROCEEDINGS OF THE 9TH INTERNATIONAL CONFERENCE ON TRANSPARENT OPTICAL NETWORKS, VOL 2, 2007, : 212 - +
  • [8] Channeling effects during focused-ion-beam micromachining of copper
    Phillips, JR
    Griffis, DP
    Russell, PE
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (04): : 1061 - 1065
  • [9] Controllable three dimensional deformation of platinum nanopillars by focused-ion-beam irradiation
    Cui, Ajuan
    Li, Wuxia
    Luo, Qiang
    Liu, Zhe
    Gu, Changzhi
    MICROELECTRONIC ENGINEERING, 2012, 98 : 409 - 413
  • [10] Effects of focused-ion-beam irradiation and prestraining on the mechanical properties of FCC Au microparticles on a sapphire substrate
    Seok-Woo Lee
    Dan Mordehai
    Eugen Rabkin
    William D. Nix
    Journal of Materials Research, 2011, 26 : 1653 - 1661