Titanium oxide thin film deposited on metallic Cr substrate by RF-magnetron sputtering

被引：7
|
作者：
Lee, Sang Hun
Lee, Kee-Sun [1 ]
Kim, Jeong Hwan
机构：
[1] Kongju Natl Univ, Div Adv Mat Sci & Engn, Kong Ju 182, South Korea
[2] Suntech Co Ltd, Seoul 48110, South Korea
来源：
MATERIALS LETTERS | 2007年 / 61卷 / 16期
关键词：
catalysts; TiO2; amorphous; thin films; hydrophilicity;
D O I：
10.1016/j.matlet.2006.11.101
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In order to develop a colored mirror with hydrophilicity, TiO2 films are deposited on the Cr and amorphous-TiO2 substrate. In TiO2/Cr, a mixed phase comprising of anatase and rutile is formed. In TiO2/amorphous-TiO2/Cr, pure anatase phase is obtained. The amorphous-TiO2 film as interlayer tends to induce micro-columnar-shaped anatase phase. The formation of anatase phase leads to an abrupt decrease of the contact angle by UV-irradiation. Hydrophilic to hydrophobic reconversion by electron-hole recombination is retarded, which seems to be due to pure anatase phase without rutile phase. (C) 2006 Elsevier B.V All rights reserved.
引用
收藏
页码：3440 / 3442
页数：3
相关论文
共 50 条
  • [1] Microstructure and properties of indium tin oxide thin films deposited by RF-magnetron sputtering
    LI ShitaoQIAO XueliangCHEN JianguoJIA FangWU ChangleState Key Laboratory of Plastic Forming Simulation and Die Mould TechnologyHuazhong University of Science and TechnologyWuhan China
    北京科技大学学报, 2006, (08) : 743 - 743
  • [2] Microstructure and properties of indium tin oxide thin films deposited by RF-magnetron sputtering
    Li Shitao
    Qiao Xueliang
    Chen Jianguo
    Jia Fang
    Wu Changle
    RARE METALS, 2006, 25 (04) : 359 - 364
  • [3] Microstructure and properties of indium tin oxide thin films deposited by RF-magnetron sputtering
    LI Shitao
    RareMetals, 2006, (04) : 359 - 364
  • [4] Effects of substrate on the structure and orientation of ZnO thin film grown by rf-magnetron sputtering
    Liu, H. F.
    Chua, S. J.
    Hu, G. X.
    Gong, H.
    Xiang, N.
    JOURNAL OF APPLIED PHYSICS, 2007, 102 (08)
  • [5] Investigation of thin film Mn-Co-Fe spinel oxide coatings deposited by RF-magnetron sputtering on metallic interconnects for SOFC applications
    Mardare, Cezarina C.
    Spiegel, Michael
    Savan, Alan
    Ludwig, Alfred
    TMS 2008 ANNUAL MEETING SUPPLEMENTAL PROCEEDINGS, VOL 1: MATERIALS PROCESSING AND PROPERTIES, 2008, : 567 - +
  • [6] Double layer structure of ZnO thin films deposited by RF-magnetron sputtering on glass substrate
    Besleaga, C.
    Stan, G. E.
    Galca, A. C.
    Ion, L.
    Antohe, S.
    APPLIED SURFACE SCIENCE, 2012, 258 (22) : 8819 - 8824
  • [7] SBTN thin film capacitors prepared by RF-magnetron sputtering
    Sun, S
    Fox, GR
    Hadnagy, TD
    INTEGRATED FERROELECTRICS, 1999, 26 (1-4) : 733 - 739
  • [8] p-ZnO Thin Films Deposited by RF-Magnetron Sputtering
    Zambom, L. S.
    Mansano, R. D.
    15TH LATIN AMERICAN WORKSHOP ON PLASMA PHYSICS (LAWPP 2014) AND 21ST IAEA TM ON RESEARCH USING SMALL FUSION DEVICES (RUSFD), 2015, 591
  • [9] Hydrogenated nanocrystalline silicon thin films deposited by rf-magnetron sputtering
    Lee, J
    Kim, W
    Shon, C
    Lee, J
    Lyou, LH
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2004, 45 : S808 - S812
  • [10] SYNTHESIS OF CUPROUS OXIDE THIN FILMS BY RF-MAGNETRON SPUTTERING
    Li, Wenhao
    SURFACE REVIEW AND LETTERS, 2018, 25 (02)
12345