Tuning copper-dioxygen reactivity and exogenous substrate oxidations via alterations in ligand electronics

被引：90
|
作者：
Zhang, CX
Liang, HC
Kim, EI
Shearer, J
Helton, ME
Kim, E
Kaderli, S
Incarvito, CD
Zuberbühler, AD
Rheingold, AL
Karlin, KD
机构：
[1] Johns Hopkins Univ, Dept Chem, Baltimore, MD 21218 USA
[2] Univ Basel, Dept Chem, CH-4056 Basel, Switzerland
[3] Univ Delaware, Dept Chem, Newark, DE 19716 USA
来源：
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2003年 / 125卷 / 03期
关键词：
D O I：
10.1021/ja028779v
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：634 / 635
页数：2
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