Growth of epitaxial TmFeCuO4 thin films by pulsed laser deposition

被引:6
|
作者
Seki, Munetoshi [1 ]
Mikami, Masateru [2 ]
Iwamoto, Fujiyuki [1 ]
Ono, Yosuke [1 ]
Osone, Takamasa [1 ]
Tabata, Hitoshi [1 ,3 ]
机构
[1] Univ Tokyo, Dept Elect Engn & Informat Syst, Grad Sch Engn, Bunkyo Ku, Tokyo 1138656, Japan
[2] Osaka Univ, Dept Mat Engn Sci, Grad Sch Engn Sci, Osaka 5608531, Japan
[3] Univ Tokyo, Dept Bioengn, Grad Sch Engn, Bunkyo Ku, Tokyo 1138656, Japan
关键词
Laser epitaxy; Solid phase epitaxy; Oxides; Magnetic materials; SOLID-PHASE EPITAXY; ZNO NANORODS; GAN; LUFE2O4; MODELS;
D O I
10.1016/j.jcrysgro.2010.04.042
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Epitaxial thin films of TmFeCuO4 with a two-dimensional triangular lattice structure were successfully grown on yttria-stabilized-zirconia substrates by pulsed laser deposition and ex situ annealing in air. The films as-deposited below 500 degrees C showed no TmFeCuO4 phase and the subsequent annealing resulted in the decomposition of film components. On the other hand, as-grown films deposited at 800 degrees C showed an amorphous nature. Thermal annealing converted the amorphous films into highly (0 0 1)-oriented epitaxial films. The results of scanning electron microscopic analysis suggest that the crystal growth process during thermal annealing is dominated by the regrowth of non-uniformly shaped islands to the distinct uniform islands of hexagonal base. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:2273 / 2278
页数:6
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