This paper presents a carrier-based approach to develop a compact model for long-channel undoped symmetric double-gate MOSFETs. The formulation starts from a solution of the Poisson's equation that is coupled to the Pao-Sah current formulation to obtain an analytic drain-current model in terms of the carrier concentration. The model provides an analytical expression to describe the dependence of the surface potential, silicon-film centric potential, inversion charge, and the current on the silicon-body thickness and the gate-oxide thickness. The model calculation is verified by comparing results to the 2-D numerical simulations, and good agreement is observed.
机构:
Department of Electronics and Communication Engineering,Thiagarajar College of Engineering,Madurai-625015,Tamilnadu,IndiaDepartment of Electronics and Communication Engineering,Thiagarajar College of Engineering,Madurai-625015,Tamilnadu,India
P.Vimala
N.B.Balamurugan
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机构:
Department of Electronics and Communication Engineering,Thiagarajar College of Engineering,Madurai-625015,Tamilnadu,IndiaDepartment of Electronics and Communication Engineering,Thiagarajar College of Engineering,Madurai-625015,Tamilnadu,India