On the structure and composition of polycrystalline carbon nitride films synthesized by reactive rf magnetron sputtering

被引：22
|
作者：
Xu, S
Li, HS
Li, YA
Lee, S
Huan, CHA
机构：
[1] Nanyang Technol Univ, NIE, Sch Sci, Singapore 259756, Singapore
[2] Natl Univ Singapore, Dept Phys, Singapore 119260, Singapore
来源：
CHEMICAL PHYSICS LETTERS | 1998年 / 287卷 / 5-6期
关键词：
D O I：
10.1016/S0009-2614(98)00227-9
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Polycrystalline beta-C3N4 films have been deposited on single-crystal KCl(100) substrates using reactive rf magnetron sputtering. The films have been characterized by transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy. A large number of grains are found distributed in various regions of the film. The dimension of the largest grain is about 4 mu m. The film is composed mainly of C and N with a small amount of O. XPS data show N-bonded to sp(3)-hybridized C with some surface oxidation. The N/C ratio in the beta-C3N4 region is deduced to be 1.23-1.27, close to an expected stoichiometric value of 1.33. The TED-measured interplanar spacings suggest that the crystalline grains are hexagonal with lattice parameters of a = 6.30 Angstrom and c = 2.46 Angstrom. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：731 / 736
页数：6
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