Spatial inhomogeneity of imprint and switching behavior in ferroelectric capacitors

被引:66
|
作者
Gruverman, A [1 ]
Rodriguez, BJ
Kingon, AI
Nemanich, RJ
Cross, JS
Tsukada, M
机构
[1] N Carolina State Univ, Raleigh, NC 27695 USA
[2] Fujitsu Labs Ltd, Atsugi, Kanagawa 2430197, Japan
关键词
D O I
10.1063/1.1570942
中图分类号
O59 [应用物理学];
学科分类号
摘要
Piezoresponse force microscopy has been used to perform nanoscale characterization of the spatial variations in the imprint and switching behavior of (111)-oriented Pb(Zr,Ti)O-3-based capacitors on Pt electrodes. Mapping of polarization distribution in the poled capacitors as well as local d(33)-V loop measurements revealed a significant difference in imprint and switching behavior between the peripheral and inner parts of the capacitors. It has been found that the inner regions of the capacitors are negatively imprinted (with the preferential direction of the normal component of polarization upward) and tend to switch back after application of the positive poling voltage. On the other hand, switchable regions at the edge of the integrated capacitors generally exhibit more symmetric hysteresis behavior. Application of an ac switching voltage, contrary to what was expected, resulted in an increase of the negatively imprinted regions. The observed effect has been explained by incomplete or asymmetric switching due to the mechanical stress conditions existing in the central parts of the capacitors. (C) 2003 American Institute of Physics.
引用
收藏
页码:3071 / 3073
页数:3
相关论文
共 50 条
  • [1] Imprint in ferroelectric capacitors
    Warren, WL
    Tuttle, BA
    Dimos, D
    Pike, GE
    AlShareef, HN
    Ramesh, R
    Evans, JT
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (2B): : 1521 - 1524
  • [2] Imprint in ferroelectric capacitors
    Sandi Natl Lab, Albuquerque, United States
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 2 B (1521-1524):
  • [3] Imprint mechanism in ferroelectric capacitors
    Evans, JT
    Cardoza, HE
    INTEGRATED FERROELECTRICS, 1995, 10 (1-4) : 267 - 277
  • [4] Mechanical stress effect on imprint behavior of integrated ferroelectric capacitors
    Gruverman, A
    Rodriguez, BJ
    Kingon, AI
    Nemanich, RJ
    Tagantsev, AK
    Cross, JS
    Tsukada, M
    APPLIED PHYSICS LETTERS, 2003, 83 (04) : 728 - 730
  • [5] Fluid Imprint and Inertial Switching in Ferroelectric La:HfO2 Capacitors
    Buragohain, Pratyush
    Erickson, Adam
    Kariuki, Pamenas
    Mittmann, Terence
    Richter, Claudia
    Lomenzo, Patrick D.
    Lu, Haidong
    Schenk, Tony
    Mikolajick, Thomas
    Schroeder, Uwe
    Gruverman, Alexei
    ACS APPLIED MATERIALS & INTERFACES, 2019, 11 (38) : 35115 - 35121
  • [7] VOLTAGE SHIFTS AND IMPRINT IN FERROELECTRIC CAPACITORS
    WARREN, WL
    DIMOS, D
    PIKE, GE
    TUTTLE, BA
    RAYMOND, MV
    RAMESH, R
    EVANS, JT
    APPLIED PHYSICS LETTERS, 1995, 67 (06) : 866 - 868
  • [8] The influence of non-ferroelectric interface layers and inclusions on the imprint behavior of ferroelectric thin film capacitors
    Boettger, Ulrich
    Braeuhaus, Dennis
    Waser, Rainer
    2007 SIXTEENTH IEEE INTERNATIONAL SYMPOSIUM ON THE APPLICATIONS OF FERROELECTRICS, VOLS 1 AND 2, 2007, : 32 - 34
  • [9] Scaling effect on statistical behavior of switching parameters of ferroelectric capacitors
    Gruverman, A
    APPLIED PHYSICS LETTERS, 1999, 75 (10) : 1452 - 1454
  • [10] Unravelling and controlling hidden imprint fields in ferroelectric capacitors
    Liu, Fanmao
    Fina, Ignasi
    Bertacco, Riccardo
    Fontcuberta, Josep
    SCIENTIFIC REPORTS, 2016, 6