ANOMALOUS CAPACITANCE OF GaN-BASED SCHOTTKY DIODES

被引:1
|
作者
Chu Kai-Hui [1 ]
Zhang Wen-Jing [1 ]
Xu Jin-Tong [1 ]
Li Xiang-Yang [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Tech Phys, State Key Labs Transducer Technol, Shanghai 200083, Peoples R China
基金
中国国家自然科学基金;
关键词
capacitance-voltage characteristic; Schottky diode; GaN-based material;
D O I
10.3724/SP.J.1010.2010.00161
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The capacitance-voltage (C-V) measurements of GaN-based Schottky diodes were carried out in the frequency range of 0.3 similar to 1.5MHz. Anomalous peaks and negative value of capacitance were observed in the C-V plots of Au/i-GaN Schottky diodes under forward bias, while neither of them was seen in the plots of Au/i-Al0.45Ga0.55N Schottky diodes. Based on the parameters extracted from the current-voltage (I-V) and C-V plots of GaN and Al0.45Ga0.55N Schottky diodes, the peak and negative capacitance are ascribed to the capture and loss of interface charges. These processes are greatly suppressed when there exists a huge series resistance in the diode.
引用
收藏
页码:161 / 166
页数:6
相关论文
共 15 条
  • [1] STUDIES OF TUNNEL MOS DIODES .1. INTERFACE EFFECTS IN SILICON SCHOTTKY DIODES
    CARD, HC
    RHODERICK, EH
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1971, 4 (10) : 1589 - +
  • [2] ANOMALOUS INDUCTIVE EFFECT IN SELENIUM SCHOTTKY DIODES
    CHAMPNESS, CH
    CLARK, WR
    [J]. APPLIED PHYSICS LETTERS, 1990, 56 (12) : 1104 - 1106
  • [3] NEW TECHNIQUE FOR THE DETERMINATION OF SERIES RESISTANCE OF SCHOTTKY-BARRIER DIODES
    CHATTOPADHYAY, P
    RAYCHAUDHURI, B
    [J]. SOLID-STATE ELECTRONICS, 1992, 35 (07) : 1023 - 1024
  • [4] EXTRACTION OF SCHOTTKY DIODE PARAMETERS FROM FORWARD CURRENT-VOLTAGE CHARACTERISTICS
    CHEUNG, SK
    CHEUNG, NW
    [J]. APPLIED PHYSICS LETTERS, 1986, 49 (02) : 85 - 87
  • [5] Hydrostatic pressure dependence of polarization-induced interface charge in AlGaN/GaN heterostructures determined by means of capacitance-voltage characterization
    Franssen, G.
    Plesiewicz, J. A.
    Dmowski, L. H.
    Prystawko, P.
    Suski, T.
    Krupczynski, W.
    Jachymek, R.
    Perlin, P.
    Leszczynski, M.
    [J]. JOURNAL OF APPLIED PHYSICS, 2006, 100 (11)
  • [6] ELECTRONIC STATES AT SILICIDE-SILICON INTERFACES
    HO, PS
    YANG, ES
    EVANS, HL
    WU, X
    [J]. PHYSICAL REVIEW LETTERS, 1986, 56 (02) : 177 - 180
  • [7] Analysis and modeling of AlxGa1-xN-based Schottky barrier photodiodes
    Monroy, E
    Calle, F
    Pau, JL
    Sánchez, FJ
    Muñoz, E
    Omnès, F
    Beaumont, B
    Gibart, P
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 88 (04) : 2081 - 2091
  • [8] ADMITTANCE OF AL/GAAS SCHOTTKY CONTACTS UNDER FORWARD BIAS AS A FUNCTION OF INTERFACE PREPARATION CONDITIONS
    MURET, P
    ELGUENNOUNI, D
    MISSOUS, M
    RHODERICK, EH
    [J]. APPLIED PHYSICS LETTERS, 1991, 58 (02) : 155 - 157
  • [9] RAAEGHI M, 1996, J APPL PHYS, V79, P7433
  • [10] Rhoderick E.H., 1988, Metal-Semiconductor Contacts, Vsecond