Fabrication of thin palladium-silver alloy film by using electroplating technique

被引:22
|
作者
Uemiya, Shigeyuki [1 ]
Endo, Tooru
Yoshiie, Ryo
Katoh, Wataru
Kojima, Toshinori
机构
[1] Gifu Univ, Fac Engn, Dept Mat Sci & Technol, Gifu 5011193, Japan
[2] Seikei Univ, Fac Sci & Engn, Dept Mat & Life Sci, Tokyo 1808633, Japan
关键词
co-deposition; electroplating; hydrogen; metal membrane; palladium-silver alloy; separation;
D O I
10.2320/matertrans.48.1119
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A thin Pd-Ag alloy film, which will be applied to fabricate membranes for hydrogen separation, was successfully deposited using an electroplating technique. The plating solution for the formation of a thin Ag-rich Ag-Pd film for electric contact consisted of PdCl2, AgNO3, HBr, and HNO2. An improvement of the electrolytic bath was achieved by a pH control, which was kept constant at 6.6 and by the addition of H3BO3 and C2H5NO2. When the concentration of PdCl2 in the bath was increased to 4 times as high as that of the reported bath, the deposited film had the preferable composition of 72 mass% Pd and 28 mass% Ag. It was confirmed by SEM observations, and XRD, and EPMA analyses that the deposited film possessed a negligible amount of cracks and pinholes and was composed of Pd-Ag alloy without exhibiting any concentration gradient along the film thickness.
引用
收藏
页码:1119 / 1123
页数:5
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