Birefringence and optical waveguiding losses in preferentially c-axis oriented LiNbO3 thin films oil SiO2 produced by electron cyclotron resonance plasma sputtering

被引:3
|
作者
Akazawa, Housei [1 ]
Shimada, Masaru [1 ]
机构
[1] NTT Microsyst Integrat Labs, Atsugi, Kanagawa 2430198, Japan
关键词
LiNbO3; ECR olasma sputtering; SiO2; birefringence; propagation loss;
D O I
10.1143/JJAP.46.1543
中图分类号
O59 [应用物理学];
学科分类号
摘要
LiNbO3 (LN) films deposited on SiO2 substrate by electron cyclotron resonance plasma sputtering and thermal treatment were structurally and optically characterized. Birefringence between 60 and 70% for single crystal was confirmed for c-axis oriented films on both Si and SiO2, whereas non-annealed amorphous film was optically isotropic. Crystallization during sputtering produced less than a 10% volume fraction of c-axis oriented spherical domains associated with the interface roughness layer. This sample had a large propagation loss of 32 dB/cm at 632.8 nm due to light scattering at the grain boundaries. LN films subjected to solid phase crystallization in a vacuum produced highly c-axis oriented columnar texture domains, which yielded propagation losses between 5 and 19 dB/cm, depending on the thickness (0.64-1.35 mu m) and the mode order. The bulk and Surface origins for waveguiding losses are discussed based on the film structure.
引用
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页码:1543 / 1548
页数:6
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