Band structure calculation of InGaAsN/GaAs, InGaAsN/GaAsP/GaAs and InGaAsN/InGaAsP/InP strained quantum wells

被引:3
|
作者
Carrère, H
Marie, X
Barrau, J
Amand, T
Ben Bouzid, S
Sallet, V
Harmand, JC
机构
[1] INSA, LNMO, F-31077 Toulouse, France
[2] LPN, F-91460 Marcoussis, France
来源
IEE PROCEEDINGS-OPTOELECTRONICS | 2004年 / 151卷 / 05期
关键词
D O I
10.1049/ip-opt:20040909
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The authors have calculated the band structure of 1.3-mum InGaAsN/GaAs(N)/GaAs compressively strained quantum wells (QW) using the band anticrossing model and an eight-band k.p Hamiltonian. The calculated interband optical transition energies have been compared to the experimental ones deduced from photocurrent. Because of the high compressive strain in the QW, strain-compensated structures may be required in order to grow stable multiple QWs; with this in view, the band structure of InGaAsN/GaAsP/GaAs QWs emitting at 1.3 mum was studied. Dilute nitride structures also offer the possibility of growing tensile-strained QW lasers emitting at 1.55 mum on an InP substrate. In order to evaluate the potentialities of such structures, the band characteristics of InGaAsN/InGaAsP/InP heterostructures were determined with a TM-polarised fundamental transition around 1.55 mum.
引用
收藏
页码:402 / 406
页数:5
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