Influence of the number of periods on the magnetization reversal process of antiferromagnetically coupled amorphous CoxSi1-x/Si multilayers

被引:1
|
作者
Zarate, L. [1 ]
Quiros, C. [1 ]
Velez, M. [1 ]
Martin, J. I. [1 ]
Alameda, J. M. [1 ]
机构
[1] Univ Oviedo, Dept Fis, Oviedo 33007, Spain
关键词
alloys; sputtering; magnetic properties;
D O I
10.1016/j.jnoncrysol.2006.12.112
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The advantage of using amorphous materials for preparing complex magnetic structures, like magnetic/non-magnetic multilayers, is illustrated for the case of the study of the Co-Si system. In particular, the antiferromagnetic AF coupling recently reported for amorphous Co-Si alloys separated by Si spacers and the associated magnetization reversal processes have been studied in (Co0.75Si0.25/Si)(n) multilayers with different number of periods n. It has been found that the magnetic field corresponding to the onset of the reversal process increases with the number of periods in a linear way. For n > 2, the magnetization stabilizes not only in the AF state but also in other intermediate configurations between both saturated states. At the same time, as n increases, all the processes of formation and breaking of these states get smoothed. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:959 / 961
页数:3
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