Electrical characterization of an RF glow discharge at room pressure

被引:0
|
作者
Perez-Martinez, J. A. [1 ]
Pena-Eguiluz, R. [2 ]
Lopez-Callejas, R. [1 ,2 ]
Mercado-Cabrera, A. [2 ]
Valencia A., R. [2 ]
Barocio, S. R. [2 ]
Godoy-Cabrera, O. G. [1 ,2 ]
de la Piedad-Beneitez, A. [1 ]
Benitez-Read, J. S. [1 ,2 ]
Pacheco-Sotelo, J. O. [1 ,2 ]
机构
[1] Inst Tecnol Toluca, AP 890, Toluca, Mexico
[2] Inst Nacl Invest Nucl, Mexico City 11801, DF, Mexico
来源
PLASMA AND FUSION SCIENCE | 2006年 / 875卷
关键词
non thermal plasma; electrical model; high frequency voltage source; impedance; transfer function;
D O I
暂无
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A non-thermal atmospheric-like plasma source able to operate at room temperature represents, by its physical nature, a considerable potential for biological applications, given its highly accurate action and extremely controllable penetration on the surface of biological tissue. As we start up a research line into this technology, we report the electrical characterization of a room pressure plasma discharge by means of a coupling network model. The discharge is produced by a 13.56MHz commercial generator. As it is impossible to measure directly its state variables (voltage and current intensity) due to the considerable perturbation created by introducing a low impedance at the system output, then an indirect estimation of such variables is achieved from experimental diagnostics at the input, so to validate the proposed electrical model.
引用
收藏
页码:250 / +
页数:2
相关论文
共 50 条
  • [1] ELECTRICAL AND CHEMICAL CHARACTERIZATION OF A-C-H PREPARED BY RF GLOW-DISCHARGE
    VARHUE, WJ
    PANDELISEV, KA
    SHINSEKI, BS
    JOURNAL OF APPLIED PHYSICS, 1990, 67 (08) : 3835 - 3841
  • [2] Atmospheric pressure RF (13.56 MHz) glow discharge: Characterization and application to "in line'' waste water treatment
    Castro, J
    Guerra-Mutis, MH
    Dulce, HJ
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 2003, 23 (02) : 297 - 307
  • [3] Atmospheric Pressure RF (13.56 MHz) Glow Discharge: Characterization and Application to “In Line” Waste Water Treatment
    Jaime B. Castro
    Marlon H. Guerra-Mutis
    Hector Jaime B. Dulce
    Plasma Chemistry and Plasma Processing, 2003, 23 : 297 - 307
  • [4] ELECTRICAL CHARACTERIZATION OF RF SPUTTERING GAS DISCHARGE
    LOGAN, JS
    MAZZA, NM
    DAVIDSE, PD
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1968, 5 (05): : 175 - &
  • [5] Electrical model of the atmospheric pressure glow discharge (APGD) in helium
    Enache, I
    Naudé, N
    Cambronne, JP
    Gherardi, N
    Massines, F
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2006, 33 (01): : 15 - 21
  • [6] Characterization of a dc atmospheric pressure normal glow discharge
    Staack, D
    Farouk, B
    Gutsol, A
    Fridman, A
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2005, 14 (04): : 700 - 711
  • [7] Spot patterns and instabilities in a pulsed low-pressure rf glow discharge
    Voronov, M.
    Hoffmann, V.
    Steingrobe, T.
    Buscher, W.
    Engelhard, C.
    Storey, A. P.
    Ray, S. J.
    Hieftje, G. M.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2014, 23 (05):
  • [8] INVESTIGATION OF AN ENHANCED GLOW STRUCTURE IN A LOW-PRESSURE RF DISCHARGE IN HELIUM
    FLOHR, R
    SCHIRMER, H
    PIEL, A
    CONTRIBUTIONS TO PLASMA PHYSICS, 1993, 33 (03) : 153 - 168
  • [9] Effect of rf power on the electrical properties of glow-discharge a-Si:H
    Tolunay, Hüseyin
    Turkish Journal of Physics, 2002, 26 (01): : 25 - 28
  • [10] CHARACTERIZATION OF SILICON-NITRIDE FILMS FORMED IN AN RF GLOW-DISCHARGE
    MURAKAMI, K
    TAKEUCHI, T
    ISHIKAWA, K
    YAMAMOTO, T
    APPLIED SURFACE SCIENCE, 1988, 33-4 : 742 - 749