Parallel optical nanolithography using nanoscale bowtie aperture array

被引：50
|
作者：
Uppuluri, Sreemanth M. V. [1 ]
Kinzel, Edward C.
Li, Yan
Xu, Xianfan
机构：
[1] Purdue Univ, Sch Mech Engn, W Lafayette, IN 47906 USA
来源：
OPTICS EXPRESS | 2010年 / 18卷 / 07期
基金：
美国国家科学基金会;
关键词：
PLANAR NANO-APERTURES; NEAR-FIELD; TRANSMISSION; LITHOGRAPHY; METALS;
D O I：
10.1364/OE.18.007369
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment system was employed to position the bowtie aperture arrays with the photoresist surface. Nanoscale direct-writing of sub-100nm features in photoresist in parallel is demonstrated. (C) 2010 Optical Society of America
引用
收藏
页码：7369 / 7375
页数：7
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