Proton irradiation effects in silicon junction diodes and charge-coupled-devices

被引:4
|
作者
Simoen, E
Vanhellemont, J
Alaerts, A
Claeys, C
Gaubas, E
Kaniava, A
Ohyama, H
Sunaga, H
Nahsiyama, I
Skorupa, W
机构
[1] IMEC, B-3001 Louvain, Belgium
[2] Kumamoto Natl Coll Technol, LT-2054 Vilnius, Lithuania
[3] Japan Atom Energy Res Inst, Takasaki Radiat Chem Res Estab, Gunma 37012, Japan
[4] Rossendorf Inc, Forschungszentrum Rossendorf EV, Inst Ionenstrahlphys & Mat Forsch, D-01314 Dresden, Germany
来源
RADIATION PHYSICS AND CHEMISTRY | 1997年 / 50卷 / 05期
关键词
D O I
10.1016/S0969-806X(97)00066-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Proton irradiation effects in silicon devices are studied, for components fabricated in various substrates in order to reveal possible hardening effects. The degradation of p-n junction diodes increases in first order proportionally with the fluence, when submitted to 10 MeV proton irradiations in the range 5 x 10(9)-5 x 10(11) cm(-2). The damage coefficients for both p-and n-type Czochralski, Float-Zone and epitaxial wafers are reported. Charge-Coupled-Devices fabricated in a 1.2 mu m CCD-CMOS technology are shown to be quite resistant to 59 MeV H+ irradiations, irrespective of the substrate type. (C) 1997 Elsevier Science Ltd. All rights reserved.
引用
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页码:417 / 422
页数:6
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