Influence of secondary emission yield on the saturation properties of multipactor discharges between two parallel metal plates

被引:13
|
作者
Buyanova, M. [1 ]
Semenov, V. E. [1 ]
Anderson, D. [2 ]
Lisak, M. [2 ]
Puech, J. [3 ]
机构
[1] Russian Acad Sci, Inst Appl Phys, Nizhnii Novgorod 603950, Russia
[2] Chalmers Univ Technol, Dept Radio & Space Sci, SE-41296 Gothenburg, Sweden
[3] Ctr Natl Etud Spatiales, F-31401 Toulouse, France
基金
俄罗斯基础研究基金会;
关键词
discharges (electric); metals; numerical analysis; plasma density; plasma simulation; secondary electron emission; space charge; SIMULATION;
D O I
10.1063/1.3374430
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A detailed numerical simulation analysis is made of the saturation stage of multipactor discharges between two infinite parallel metal plates in vacuum exposed to a rf voltage. The main physical effect causing saturation of the multipactor discharge is increased space charge, as the electron density becomes large. It is found that the properties of the saturation stage depend crucially on the value of the secondary emission yield of the metal surfaces. Below a certain threshold value, the discharge has a two-sided character, but at this threshold the discharge makes an abrupt transition into two decoupled single-sided multipactor discharges containing significantly increased electron densities. The result of the numerical simulations gives a good picture of the saturation properties of the multipactor discharge and is also supplemented by an approximate analytical investigation that highlights and explains the characteristic properties of the observed saturation behavior.
引用
收藏
页数:12
相关论文
共 33 条
  • [1] Multipactor Analysis of Dielectric-Loaded Parallel Plates with Local-Regional Increment of Secondary Emission Yield
    Lin, Shu
    Zhong, Huan
    Huang, Lin
    Li, Yongdong
    Wong, Patrick Y.
    Zhang, Peng
    2024 JOINT INTERNATIONAL VACUUM ELECTRONICS CONFERENCE AND INTERNATIONAL VACUUM ELECTRON SOURCES CONFERENCE, IVEC + IVESC 2024, 2024,
  • [2] Influence of the angular anisotropy of secondary emission on the characteristics of a two-sided multipactor
    Vdovicheva N.K.
    Sazontov A.G.
    Sazontov V.A.
    Semenov V.E.
    Radiophysics and Quantum Electronics, 2006, 49 (5) : 368 - 376
  • [3] Influence of secondary electron yield of material on two-sided multipactor discharge in cavity
    Dong Ye
    Liu Qing-Xiang
    Pang Jian
    Zhou Hai-Jing
    Dong Zhi-Wei
    ACTA PHYSICA SINICA, 2018, 67 (03)
  • [4] Effect of Secondary Emission Yield and Initial Charge of Dielectric Material on Multipactor in Parallel-Plate Dielectric-Loaded Waveguide
    Zhai, Yonggui
    Wang, Hongguang
    Zhang, Lei
    Lin, Shu
    Li, Yun
    Li, Yongdong
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2019, 66 (12) : 5333 - 5338
  • [5] Point Charge between Two Plane-Parallel Metal Plates
    Samedov, V. V.
    PHYSICS OF ATOMIC NUCLEI, 2023, 86 (12) : 2634 - 2641
  • [6] Point Charge between Two Plane-Parallel Metal Plates
    V. V. Samedov
    Physics of Atomic Nuclei, 2023, 86 : 2634 - 2641
  • [7] Spontaneous emission between two parallel plates, one or both infinitely permeable
    Alves, D.T.
    Farina, C.
    Tort, A.C.
    Physical Review A - Atomic, Molecular, and Optical Physics, 2000, 61 (03): : 341021 - 341024
  • [8] Spontaneous emission between two parallel plates, one or both infinitely permeable
    Alves, DT
    Farina, C
    Tort, AC
    PHYSICAL REVIEW A, 2000, 61 (03): : 4
  • [9] SIMULATION OF HEAT FLUX BETWEEN TWO PARALLEL METAL PLATES WITH THERMIC FLUID AS A MEDIA
    Bharambe, Ganesh
    Patil, A. M.
    Kale, Sandip
    Sapate, Kumar Digambar
    Dabeer, Prakash
    PROCEEDINGS OF THE ASME INTERNATIONAL MECHANICAL ENGINEERING CONGRESS AND EXPOSITION, 2015, VOL 7A, 2016,
  • [10] The Effect of Suction and Injection on the Unsteady Flow Between two Parallel Plates with Variable Properties
    Attia, Hazem Ali
    JOURNAL OF APPLIED SCIENCE AND ENGINEERING, 2005, 8 (01): : 17 - 22