Comparative Study of Charge Transport in Si and Ge Nanowires

被引:0
|
作者
Verma, A. [1 ]
Buin, A. K. [2 ]
Anantram, M. P. [3 ]
机构
[1] Texas A&M Univ, Dept Elect Engn & Comp Sci, Kingsville, TX USA
[2] Univ Montreal, Dept Chim, Montreal, PQ, Canada
[3] Univ Washington, Dept Elect Engn, Seattle, WA USA
关键词
Germanium nanowires; silicon nanowires; low-field mobility; high-field transport; ensemble Monte Carlo;
D O I
10.1109/NMDC.2009.5167559
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on detailed calculations of charge mobility in small diameter Ge nanowires, and a comparison with equivalent diameter Si nanowires. The basis for the calculations is provided by band structure calculations within a sp(3)d(5)s* tight-binding scheme. Charge-phonon scattering rates are evaluated using Fermi's Golden Rule. Mobility calculations are performed using multi-subband momentum relaxation time approximation. In addition, high-field charge transport is also compared among the two classes of materials. High-field transport results are evaluated using ensemble Monte Carlo simulation. High-field transport behavior is found to be qualitatively similar between Si and Ge nanowires, while low-field mobility results show interesting behavior when compared to bulk Si and Ge. Besides providing. a comparative analysis of the behavior of these materials, our work also helps to place an upper bound on their expected electronic response.
引用
收藏
页码:64 / +
页数:2
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