Deformation during surface modification of silicon carbide using rare-gas ion-beam irradiation

被引:0
|
作者
Nogami, S [1 ]
Ohtsuka, S [1 ]
Toloczko, MB [1 ]
Hasegawa, A [1 ]
Abe, K [1 ]
机构
[1] Tohoku Univ, Dept Quantum Sci & Energy Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan
关键词
silicon carbide (SiC); surface modification; ion irradiation; finite element modeling (FEM);
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Surface shape modification of silicon carbide (SiC) as induced by swelling resulting from irradiation has been studied using helium (He) ion irradiation (similar to2x10(21) He/m(2)) at room temperature. Using a mask (TEM-mesh) containing an array of microscopic holes, an array of bumps, resulting from near-surface swelling, was produced on the surface of SiC. The exterior appearance of these bumps is smooth with no evidence of blistering or cracking, even when calculated swelling values are greater than 10%(1.2). The fact that these bumps are free of cracks and blistering phenomenon is welcome but surprising because the irradiated regions are confined in their deformation by the surrounding unirradiated regions. The aim of the present study is to consider some possible deformation mechanisms that could allow these bumps to form without cracking or blistering and also to investigate the dependence of swelling on mask hole-size and the projected-range of He-ions. In this study, accommodation deformation of SiC during He-ion irradiation was simulated using finite element modeling (FEM). Elastic deformation and irradiation induced creep provided the accommodation deformation. When using only elasticity to provide the accommodation deformation, the calculated stresses at the vicinity of the boundary between the irradiated and the unirradiated region were much higher than the fracture stress of SiC. However, when elasticity and irradiation creep provided the accommodation deformation, the stresses were below the fracture stress. Swelling increased with increasing the mask hole-size, and the effect of the projected range was varied with the mask hole-size when irradiation enhanced creep was introduced into the FEM model.
引用
收藏
页码:1367 / 1370
页数:4
相关论文
共 50 条
  • [1] RARE-GAS INCORPORATION IN ION-BEAM SPUTTERING DEPOSITED SI FILMS
    SCHWEBEL, G
    PELLET, C
    GAUTHERIN, G
    VACUUM, 1986, 36 (11-12) : 1020 - 1020
  • [2] Ion-beam analysis of silicon carbide
    Leavitt, JA
    McIntyre, LC
    Ashbaugh, MD
    Cox, RP
    Lin, Z
    Gregory, RB
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1996, 118 (1-4): : 613 - 616
  • [3] SURFACE MODIFICATION BY ION-BEAM
    NAKASHIMA, S
    ISHIKAWA, Y
    JOURNAL OF JAPANESE SOCIETY OF TRIBOLOGISTS, 1994, 39 (11) : 939 - 944
  • [4] PULSED ION-BEAM IRRADIATION OF SILICON
    CHU, WK
    MADER, SR
    GOREY, EF
    BAGLIN, JEE
    HODGSON, RT
    NERI, JM
    HAMMER, DA
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1982, 194 (1-3): : 443 - 447
  • [5] Lateral Deformation of a Silicon Crystal Surface Structure Induced by Low-Fluence Ion-Beam Irradiation
    Guo, Xiaowei
    Momota, Sadao
    Nitta, Noriko
    Maeda, Kazuki
    E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY, 2015, 13 : 35 - 41
  • [6] Polishing silicon modification layer on silicon carbide surface by ion beam figuring
    Deng, Weijie
    Chinese Optics Letters, 2014, 12
  • [7] NEUTRALIZED ION-BEAM STUDIES OF THE RARE-GAS HYDRIDES - OBSERVATION OF UNIQUE METASTABILITY FOR NEH
    SELGREN, SF
    HIPP, DE
    GELLENE, GI
    JOURNAL OF CHEMICAL PHYSICS, 1988, 88 (05): : 3116 - 3124
  • [8] SURFACE MODIFICATION OF DENSE SILICON-NITRIDE BY ION-BEAM TECHNIQUES
    TAUT, C
    HERRMANN, M
    MUCHA, A
    SILICON NITRIDE 93, 1994, 89-9 : 319 - 323
  • [9] ION-BEAM SURFACE MODIFICATION OF ALUMINUM
    MCCAFFERTY, E
    NATISHAN, PM
    HUBLER, GK
    CORROSION SCIENCE, 1993, 35 (1-4) : 239 - 246
  • [10] ION-BEAM PROCESSING FOR SURFACE MODIFICATION
    HIRVONEN, JK
    ANNUAL REVIEW OF MATERIALS SCIENCE, 1989, 19 : 401 - 417