Tunable ultrasharp terahertz plasma edge in a lightly doped narrow-gap semiconductor

被引:10
|
作者
Ju, Xuewei [1 ]
Hu, Zhiqiang [1 ]
Huang, Feng [1 ]
Wu, Haibin [1 ]
Belyanin, Alexey [2 ]
Kono, Junichiro [3 ,4 ,5 ]
Wang, Xiangfeng [1 ]
机构
[1] Fuzhou Univ, Sch Mech Engn & Automat, Fuzhou 350108, Peoples R China
[2] Texas A&M Univ, Dept Phys, College Stn, TX 77843 USA
[3] Rice Univ, Dept Elect & Comp Engn, Houston, TX 77005 USA
[4] Rice Univ, Dept Phys & Astron, Houston, TX 77005 USA
[5] Rice Univ, Dept Mat Sci & NanoEngn, Houston, TX 77005 USA
关键词
TEMPERATURE; FILTER;
D O I
10.1364/OE.418624
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Plasma edges in metals typically occur in the visible range, producing characteristic colors of metals. In a lightly doped semiconductor, the plasma edge can occur in the terahertz (THz) frequency range. Due to low scattering rates and variable electron densities in semiconductors, such THz plasma edges can be extremely sharp and greatly tunable. Here, we show that an ultrasharp THz plasma edge exists in a lightly n-doped InSb crystal with a record-high transmittance slope of 80 dB/THz. The frequency at which this sharp edge happens can be readily tuned by changing the temperature, electron density, scattering rate, and sample thickness. The edge frequency exhibited a surprising increase with decreasing temperature below 15 K, which we explain as a result of a weak-to-strong transition in the scattering rate, going from omega tau gamma >> 1 to omega tau similar to 1. These results indicate that doped narrow-gap semiconductors provide a versatile platform for manipulating THz waves in a controllable manner, especially as a high-pass filter with an unprecedented on/off ratio. (C) 2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
引用
收藏
页码:9261 / 9268
页数:8
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