Electric charges and forces in atomic force microscopy and nano-xerography

被引:3
|
作者
Stemmer, A. [1 ]
Ziegler, D. [1 ]
Seemann, L. [1 ]
Rychen, J. [2 ]
Naujoks, N. [1 ]
机构
[1] ETH, Nanotechnol Grp, Tannenstr 3, CH-8092 Zurich, Switzerland
[2] Nanoins GmbH, CH-8005 Zurich, Switzerland
来源
ELECTROSTATICS 2007 | 2009年 / 142卷
关键词
CARBON NANOTUBES; RESOLUTION; PATTERNS; CONTRAST;
D O I
10.1088/1742-6596/142/1/012048
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Electrostatic forces generated by contact potential differences, localized charges, or externally applied voltages play a crucial role in atomic force microscopy. Electrostatic forces mediate the non-contact measurement of local potentials by the Kelvin probe technique, enabling compositional mapping of surfaces. However, if not compensated properly, electrostatic forces lead to height errors in topography images acquired in tapping mode. We present a single scan Kelvin probe force microscopy technique that compensates local electrostatic forces and allows simultaneous height and potential measurements in tapping mode. Electrostatic forces also direct the localized assembly of structures in nano-xerography. Here we describe how positive charges, written into a thin film of poly(methyl)methacrylate with the conductive tip of an atomic force microscope, guide the deposition of carboxyl-functionalized multiwalled carbon nanotubes suspended in isopropyl-acohol.
引用
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页数:5
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