In-situ transmission electron microscopy study of the nanoindentation behavior of Al

被引:42
|
作者
Minor, AM [1 ]
Lilleodden, ET
Stach, EA
Morris, JW
机构
[1] Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Div Mat Sci, Berkeley, CA 94720 USA
[3] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Natl Ctr Electron Microscopy, Berkeley, CA 94720 USA
关键词
nanoindentation; in-situ TEM; Al; thin films; grain size;
D O I
10.1007/s11664-002-0028-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Nanoindentation is a useful technique for investigating fundamental, mechanisms associated with small-volume deformation, processes that are often obscured on coarser scales. Recently, a novel experimental technique of in-situ nanoindentation for the transmission electron microscope (TEM), which provides real-time observations of the mechanisms associated with localized deformation, has been developed. Calibration of the force-displacement-voltage relation and load-frame compliance associated with this instrument allows quantitative force-displacement measurements to be obtained in the manner of traditional indentation experiments. Here, we describe the experimental technique along with methods for quantifying the load-displacement response. Additionally, results from experiments into Al thin films are presented.
引用
收藏
页码:958 / 964
页数:7
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