AEI 35-Crystallographic goodness of fit: A new treatment of model complexity

被引：0
|
作者：
Fenn, Timothy D. [1 ]
Pozharski, Edwin [2 ]
Wilson, Mark A. [3 ,4 ]
机构：
[1] Stanford Univ, James H Clark Ctr, Stanford, CA 94305 USA
[2] Univ Maryland, Dept Pharmaceut Sci, Baltimore, MD 21201 USA
[3] Univ Nebraska, Dept Biochem, Lincoln, NE 68588 USA
[4] Univ Nebraska, Redox Biol Ctr, Lincoln, NE 68588 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2008年 / 236卷
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
35-AEI
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页数：1
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