Diagnostics and modeling of moderate pressure microwave H2/CH4 plasmas obtained under pulsed mode

被引:0
|
作者
Lombardi, G [1 ]
Duten, X [1 ]
Hassouni, K [1 ]
Gicquel, A [1 ]
机构
[1] Univ Paris 13, LIMHP, CNRS, UPR 1311, F-93430 Villetaneuse, France
来源
DIAMOND MATERIALS VII, PROCEEDINGS | 2001年 / 2002卷 / 25期
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中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
This paper deals with experimental investigation and modeling of pulsed H-2/CH4 plasmas used for diamond thin films deposition. Time-resolved measurements of the gas temperature determined from the Doppler broadening of the Balmer H-alpha line and of the discharge volume (V-pl) are reported. The measured temporal evolution of V-pl and input microwave power are used as input parameters for a thermochemical OD model that takes into account 28 species and 2 energy modes. This model enables us to estimate time-variation of the electron energy distribution function, gas temperature and chemical species densities. The time-variation of the gas temperature are non-monotonous and characterized by a sharp increase at the beginning of the pulse and a maximum temperature, (3000 K 250 mus after the pulse ignition). The in-pulse steady state temperature obtained from the model is in agreement with the measured one although a discrepancy is obtained on the shape of the early time-variation. The model is used to investigate the effect of duty cycle at a constant average power density on the dissociation degree in the discharge. Results shows a large enhancement of H-atom. and CH3 densities as the duty cycle is decreased.
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页码:192 / 199
页数:8
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