Structure-property relationships for nano-porous poly(methyl-silesquioxane) films with low-dielectric constants prepared via organic/inorganic polymer hybrids

被引:0
|
作者
Nguyen, CV [1 ]
Hawker, CJ [1 ]
Hedrick, JL [1 ]
Jaffe, RL [1 ]
Miller, RD [1 ]
Remenar, JF [1 ]
Rhee, HW [1 ]
Toney, MF [1 ]
Trollsås, M [1 ]
Volksen, W [1 ]
Yoon, DY [1 ]
机构
[1] ELORET Inc, Sunnyvale, CA 94087 USA
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暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
We present here results on ct technique of incorporating air-voids into poly(methyl-silsesquioxane) (PMSSQ) for obtaining porous material with lower dielectric constant. By thermal decomposition of star-shaped hydroxy-terminated poly(carpolactone) (PCL) from a PCL/PMSSQ polymer hybrids, nanometer-scaled pores are introduced in PMSSQ whose dielectric constants show a continuous decrease with higher PCL compositions. Data from DMA, FTIR, TEM and TGA experiments for investigating the pore-generating process are reported.
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页码:38 / 45
页数:8
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