共 50 条
- [1] Discharge instability induced by external laser preionization of a XeF discharge laser APPLIED PHYSICS B-LASERS AND OPTICS, 2010, 98 (2-3): : 501 - 505
- [3] Discharge instability induced by external laser preionization of a XeF discharge laser Applied Physics B, 2010, 98 : 501 - 505
- [4] Experimental study of 248nm excimer laser etching of alumina ADVANCED LASER MANUFACTURING TECHNOLOGY, 2016, 10153
- [5] Microprocessing of organic material for semiconductor packaging by 248 nm excimer laser LASER-BASED MICRO- AND NANOPROCESSING XIII, 2019, 10906
- [6] DEEP UV ANR PHOTORESISTS FOR 248 NM EXCIMER LASER PHOTOLITHOGRAPHY ADVANCES IN RESIST TECHNOLOGY AND PROCESSING VI, 1989, 1086 : 34 - 47
- [9] DYE-LASER RADIATION IN THE 370-760-NM REGION PUMPED BY A XEF EXCIMER LASER APPLIED OPTICS, 1985, 24 (07): : 937 - 938
- [10] Discharge excimer laser with an automated spark preionization Atmospheric and Oceanic Optics(English Edition of the Journal Optika Atmosfery i Okeana), 1997, 10 (11):