Resonant plasma excitation by electron cyclotron waves - Fundamentals and applications

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作者：
Oechsner, H
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PLASMA PROCESSING OF SEMICONDUCTORS | 1997年 / 336卷
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码：157 / 180
页数：24
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