Current driven resistance changes in low resistance x area magnetic tunnel junctions with ultra-thin Al-Ox barriers

被引:14
|
作者
Deac, A
Redon, O
Sousa, RC
Dieny, B
Nozières, JP
Zhang, Z
Liu, Y
Freitas, PP
机构
[1] CEA Grenoble, CNRS, URA CEA DSM, SPINTEC,SPM, F-38054 Grenoble, France
[2] CEA, DRT Leti, F-38054 Grenoble, France
[3] Inst Engn Sistemas & Computadores, P-100029 Lisbon, Portugal
关键词
D O I
10.1063/1.1687533
中图分类号
O59 [应用物理学];
学科分类号
摘要
Current induced resistance changes were investigated in magnetic tunnel junctions with ultrathin Al-O-x barriers. The nonuniformity of the insulator induced a strong coupling between the two magnetic electrodes and no magnetoresistance. However, the current-voltage (I-V) characteristics at low bias voltages were consistent with a tunnellike behavior. At larger bias voltages, they showed an abrupt change of slope that was reversible for an opposite voltage polarity. The resistance versus current (R-I) curves exhibited reversible resistance changes that reached over 100%. We interpret this as controlled electromigration in local nanoconstrictions of the barrier. (C) 2004 American Institute of Physics.
引用
收藏
页码:6792 / 6794
页数:3
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