Temperature-dependent growth of smooth DNA film

被引：2
|
作者：
Machida, S
Nakayama, T
机构：
[1] JST, ICORP, Nanoscale Quantum Conductor Array Project, Kawaguchi, Saitama 3320012, Japan
[2] Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050044, Japan
[3] Univ Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3050044, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2006年 / 45卷 / 6A期
关键词：
DNA; DNA oligomer; mica; temperature dependence; melting temperature (T-m); DNA film; atomic force microscopy (AFM);
D O I：
10.1143/JJAP.45.5183
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We could form a smooth DNA film using synthesized short oligomers (10-mer adenine oligomer and thymine oligomer). The DNA film was observed by atomic force microscopy (AFM) in air. We found from AFM images that the DNA film growth strongly depended on sample preparation temperature within the range of 20 to 40 degrees C. The DNA film formed at 30 degrees C was markedly smoother than those prepared at other temperatures. This marked variation in morphology was attributed to the temperature-dependent interaction between oligomers. We discussed the interaction in light of the melting temperature of the DNA oligomers in saturated solution.
引用
收藏
页码：5183 / 5185
页数：3
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