Lighting design for machine vision application

被引:69
|
作者
Kopparapu, Sunil Kumar
机构
[1] Tata Consultancy Serv Ltd, Cognit Syst Res Lab, Bombay 400705, Maharashtra, India
[2] CSIRO, Queensland Ctr Adv Technol, Kenmore, Qld 4069, Australia
关键词
lighting design; machine vision; optimal light placement; simulated annealing;
D O I
10.1016/j.imavis.2005.12.016
中图分类号
TP18 [人工智能理论];
学科分类号
081104 ; 0812 ; 0835 ; 1405 ;
摘要
Low-level image processing is an essential first step in any machine vision application. Low-level vision processing tasks need good lighting in the work environment for them to function robustly. Hence, good and uniform illumination from external light source is essential for machine vision applications to function. In this paper, we suggest a design procedure to obtain uniform illumination on the scene being imaged using several light sources. We pose the problem of determining the optimal position of the light sources as a minimisation problem. Simulation results show the effectiveness and suitability of the proposed procedure to illuminate the scene uniformly. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:720 / 726
页数:7
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