Adhesion of thin metallic layers on Au surfaces

被引:0
|
作者
Zotti, Linda A. [1 ,2 ]
O'Regan, David D. [3 ,4 ]
机构
[1] Univ Autonoma Madrid, Dept Fis Teor Mat Condensada, E-28049 Madrid, Spain
[2] Univ Autonoma Madrid, IFIMAC, E-28049 Madrid, Spain
[3] Univ Dublin, Trinity Coll Dublin, Sch Phys, AMBER, Dublin 2, Ireland
[4] Univ Dublin, Trinity Coll Dublin, CRANN Inst, Dublin 2, Ireland
基金
欧洲研究理事会; 爱尔兰科学基金会;
关键词
metallic interfaces; DFT; work of separation; thin metallic adlayers; INTERFACE; 1ST-PRINCIPLES; ULTRATHIN;
D O I
10.1088/1361-648X/ac6852
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We carried out first-principles density-functional theory calculations to study the work of separation for five different metal-metal interfaces, each of them comprising thin layers of selected metals (Cr, W, Ta, Al or Ti) lying on top of Au surfaces. We found that the highest work of separation is obtained for one-atom-thick layers. Increasing the number of atomic layers leads the work of separation to oscillate with the thickness, and ultimately tend to a limiting value for a large number of layers. Interestingly, for most cases the lowest work of separation is obtained for two-atom layers. We find that this behaviour is mirrored by the quantity of charge transferred between the two metals on the one hand, and their spatial distance on the other.
引用
收藏
页数:7
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