Dry thienylation of the silicon (111)-(7 x 7) surface

被引：52
|
作者：
Cao, Y
Yong, KS
Wang, ZQ
Chin, WS
Lai, YH
Deng, JF
Xu, GQ
机构：
[1] Natl Univ Singapore, Dept Chem, Singapore 119260, Singapore
[2] Fudan Univ, Dept Chem, Shanghai 200433, Peoples R China
来源：
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2000年 / 122卷 / 08期
关键词：
D O I：
10.1021/ja993386q
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：1812 / 1813
页数：2
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