Avoiding the pitfalls of surface analysis

被引：0
|
作者：
Beck, SE
Gilicinski, AG
机构：
来源：
SOLID STATE TECHNOLOGY | 1997年 / 40卷 / 10期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A variety of surface analytical tools are available to the process engineer, but data from these tools may be misleading because of hidden pitfalls in the surface analysis technique. Examples from x-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS), total reflection x-ray fluorescence (TXRF), and atomic force microscopy (AFM) are used to illustrate some of the problems encountered when interpreting data from surface analysis equipment. Suggestions are made to assist users of these techniques in avoiding these pitfalls.
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页码：169 / &
页数：6
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