XY stages driving an electron beam mastering system for high density optical recording

被引：11

作者：

Hosaka, S

Suzuki, T

Yamaoka, M

Katoh, K

Isshiki, F

Miyamoto, M

Miyauchi, Y

Arimoto, A

Nishida, T

机构：

[1] Hitachi Ltd, Cent Res Lab, Kokubunji, Tokyo 1858601, Japan

[2] Gunma Univ, Dept Elect Engn, Kiryu, Gumma 3768515, Japan

来源：

MICROELECTRONIC ENGINEERING | 2002年 / 61-2卷

关键词：

electron beam mastering system; ultrahigh density optical recording; XY stage drive;

D O I：

10.1016/S0167-9317(02)00498-7

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

XY stages driving an electron beam (EB) mastering system for high density optical recording has been designed and prototyped. This system has some unique techniques for subnanometer accuracy, i.e. super-polygon approximation for spiral writing, auto focus adjusting, highly precise position-detecting, and a 32-bit data format. The system demonstrated fine pits writing with a small size of 50 X 80 nm and an accuracy of position of about 1.6 nm (sigma) in a rotation direction. We confirmed that the mastering system can be applied to fabrication of 40 Gb/in(2) fine pit patterns. Furthermore, this system has the potential to write a fine pit pattern of over 100 Gb/in(2). (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：309 / 316

页数：8

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