InAs/GaAs quantum-dot infrared photodetectors grown by molecular beam epitaxy

被引:5
|
作者
Pal, D. [1 ]
Walker, J. [1 ]
Towe, E. [1 ]
机构
[1] Carnegie Mellon Univ, Dept Elect & Comp Engn, Lab Photon, Pittsburgh, PA 15213 USA
来源
关键词
D O I
10.1116/1.2190675
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have studied InAs/GaAs quantum-dot photodetectors containing 50 periods of quantum-dot layers. Clean photoresponse spectra and a peak responsivity of about 99 mA/W are observed up to about 120 K. The device structures contain no (Al; Ga)As current-blocking layers. A relatively low dark current and a high peak responsivity(0.242 A/W) are observed at 78 K: These results suggest that increasing the dot density, controlling the dopant impurity concentration, and incorporating a current-blocking layer would most likely increase the operating temperature of the devices beyond 120 K. (c) 2006 American Vacuum Society.
引用
收藏
页码:1532 / 1535
页数:4
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