Investigation of SiGe Heterojunction Bipolar Transistor over an Extreme Temperature Range

被引:0
|
作者
Shimukovitch, A. [1 ]
Sakalas, P. [1 ,2 ]
Ramonas, M. [1 ,4 ]
Schroter, M. [2 ,3 ]
Jungemann, C. [4 ]
Kraus, W. [5 ]
机构
[1] Lithuania Acad Sci, Inst Semicond Phys, Fluctuat Phenomena Lab, Gostauto 11, LT-232600 Vilnius, Lithuania
[2] Tech Univ Dresden, CEDIC, D-01069 Dresden, Germany
[3] Univ Calif San Diego, ECE Dept, La Jolla, CA 92093 USA
[4] Bundeswehr Univ, EIT4, D-85577 Neubiberg, Germany
[5] Telefunken Semicond GmbH, Modeling & Simulat QP34, D-74072 Heilbronn, Germany
来源
NOISE AND FLUCTUATIONS | 2009年 / 1129卷
关键词
SiGe HBTs; temperature dependence; transit frequency; diffusion noise; hydrodynamic device simulation; HICUM; CRYOGENIC TEMPERATURES; NOISE; PERFORMANCE; DESIGN;
D O I
暂无
中图分类号
Q6 [生物物理学];
学科分类号
071011 ;
摘要
Dc, high frequency (hf) characteristics and noise of SiGe HBTs; were investigated in a wide ambient temperature (7) range from 4 K to 423 K. SiGe HBTs with low emitter concentration (LEC) and trapezoidal Ge base doping were found good candidates for cryogenic applications. Both hydrodynamic (HD) device simulation and compact model (CM) HICUM show good agreement with experimental data in the temperature range of 300 K-423 K. The collector current did not show any leakage related to electric field assisted tunneling via traps in the base. Rapid decrease of transit frequency (f(T)) with T is explained in terms of the carrier delay distribution. Noise figure (NFmin) analysis reveals that the main noise contributors are related to collector current fluctuations (shot-like noise) and thermal noise in the base at high T. Base current fluctuations related noise becomes of importance only at high injection. Simulated diffusion noise distribution shows that collector terminal electronic noise originates at the emitter-base (BE) junction but not in base-collector (BC) junction area.
引用
收藏
页码:309 / +
页数:2
相关论文
共 50 条
  • [1] Novel microwave power sige heterojunction bipolar transistor with high thermal stability over a wide temperature range
    Lu Dong
    Jin Dong-Yue
    Zhang Wan-Rong
    Zhang Yu-Jie
    Fu Qiang
    Hu Rui-Xin
    Gao Dong
    Zhang Qing-Yuan
    Huo Wen-Juan
    Zhou Meng-Long
    Shao Xiang-Peng
    ACTA PHYSICA SINICA, 2013, 62 (10)
  • [2] High gain SiGe/Si heterojunction bipolar transistor at liquid nitrogen temperature
    Zou, Deshu
    Chen, Jianxin
    Shen, Guangdi
    Gao, Guo
    Du, Jinyu
    Zhang, Shiming
    Yuan, Ying
    Wang, Dongfeng
    Deng, Jun
    Ni, W.X.
    Hansson, G.V.
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 1997, 18 (05): : 367 - 370
  • [3] Self heating modeling of SiGe heterojunction bipolar transistor
    Sulima, Pierre Yvan
    Battaglia, Jean-Luc
    Zimmer, Thomas
    Batsale, J.-C.
    INTERNATIONAL COMMUNICATIONS IN HEAT AND MASS TRANSFER, 2007, 34 (05) : 553 - 563
  • [4] On the reliability of SiGe microwave power heterojunction bipolar transistor
    Zhang, JS
    Tsien, PH
    Chen, PY
    Nanver, LK
    Slotboom, JW
    2000 IEEE HONG KONG ELECTRON DEVICES MEETING, PROCEEDINGS, 2000, : 90 - 93
  • [5] Frequency Response of Si/SiGe Heterojunction Bipolar Transistor
    Das, Arnima
    Kanjilal, Maitreyi Ray
    Biswas, Payel
    COMPUTATIONAL ADVANCEMENT IN COMMUNICATION CIRCUITS AND SYSTEMS, ICCACCS 2014, 2015, 335 : 339 - 344
  • [6] Pulsed microwave characterization of an SiGe heterojunction bipolar transistor
    Wartenberg, SA
    Westgate, CR
    IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 1999, 47 (04) : 416 - 418
  • [7] Heterojunction barrier effects in Si/SiGe/Si double heterojunction bipolar transistor
    Zhang, Wanrong
    Zeng, Zheng
    Luo, Jinsheng
    Tien Tzu Hsueh Pao/Acta Electronica Sinica, 1996, 24 (11): : 43 - 47
  • [8] Base profile design in Si/SiGe heterojunction bipolar transistor
    Tsinghua Univ, Beijing, China
    Chinese Journal of Electronics, 1998, 7 (04): : 338 - 340
  • [9] Characterization of SiGe base layer in Si/SiGe heterojunction bipolar transistor layer structure
    Tsinghua Univ, Beijing, China
    Thin Solid Films, 1-2 (13-15):
  • [10] Characterization of SiGe base layer in Si/SiGe heterojunction bipolar transistor layer structure
    Zhang, JS
    Jin, XJ
    Tsien, PH
    Lo, TC
    THIN SOLID FILMS, 1998, 333 (1-2) : 13 - 15