Surface patterning in Ge-Se amorphous layers

被引:8
|
作者
Csarnovics, I. [1 ]
Veres, M. [2 ]
Nemec, P. [3 ]
Latif, M. R. [4 ]
Hawlova, P. [3 ]
Molnar, S. [1 ]
Kokenyesi, S. [5 ]
机构
[1] Univ Debrecen, Dept Expt Phys, Debrecen, Hungary
[2] HAS, Inst Solid State Phys & Opt, Wigner RCP, Budapest, Hungary
[3] Univ Pardubice, Fac Chem Technol, Dept Graph Arts & Photophys, Pardubice, Czech Republic
[4] Boise State Univ, Dept Elect & Comp Engn, Boise, ID 83725 USA
[5] Univ Debrecen, Dept Elect Engn, Debrecen, Hungary
关键词
Amorphous chalcogenides; Ge-Se system; Thin films; Light induced surface patterning; Raman spectroscopy; Atomic force microscopy; PHOTOINDUCED MASS-TRANSFER; CHALCOGENIDE THIN-FILMS; PULSED-LASER DEPOSITION; RELIEF FORMATION; GLASSES; GESE2;
D O I
10.1016/j.jnoncrysol.2016.12.035
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Compositional and fabrication method dependences of laser-induced geometrical surface relief formation in Ge-Se amorphous layers were investigated with the aim to determine the possible role of initial conditions in the mechanism and efficiency of optical recording. The results show that pulsed laser deposition has some advantages in composition preservation and surface relief formation in comparison with thermal evaporation for producing layers with high sensitivity and efficiency of surface relief grating formation, especially in layers with Ge24Se76 composition. It was shown that modulation depth of the created surface structures increases with increasing Se content in Ge-Se amorphous chalcogenide layers. Thermal annealing has essential influence on the recording parameters, enabling additional insight into the possible mechanisms of light induced surface patterning in this type of light-sensitive amorphous chalcogenides. Raman spectroscopy was used to identify local structure of produced surface patterns. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:51 / 56
页数:6
相关论文
共 50 条
  • [1] AMORPHOUS STRUCTURE OF GE-SE SYSTEM
    UEMURA, O
    SAGARA, Y
    SATOW, T
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1974, 26 (01): : 99 - 103
  • [2] Light and electron beam induced surface patterning in Ge-Se system
    Csarnovics, I.
    Cserhati, C.
    Kokenyesi, S.
    Latif, M. R.
    Mitkova, M.
    Nemec, P.
    Hawlova, P.
    Nichol, T.
    Veres, M.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2016, 18 (9-10): : 793 - 797
  • [3] Photoinduced effects in amorphous Ge-Se films
    Liu, Qiming
    Zhao, Xujian
    Gan, Fuxi
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2006, 8 (05): : 1838 - 1842
  • [4] THERMODYNAMIC PROPERTIES OF AMORPHOUS GE-SE ALLOYS
    TOMURA, K
    MAEKAWA, H
    YOSHIZAWA, M
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1975, 14 (12) : 2085 - 2086
  • [5] Photoinduced optical changes in amorphous Se and Ge-Se films
    Acad of Sciences of Czech Republic, Pardubice, Czech Republic
    J Non Cryst Solids, 1-3 (177-181):
  • [6] Photoinduced optical changes in amorphous Se and Ge-Se films
    Tichy, L
    Ticha, H
    Nagels, P
    Callaerts, R
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1998, 240 (1-3) : 177 - 181
  • [7] RAMAN-SCATTERING IN AMORPHOUS GE-SE MIXTURES
    SHIRAFUJI, J
    OHSHIMA, Y
    INUISHI, Y
    JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1974, 36 (03) : 915 - 915
  • [8] STRUCTURE OF AMORPHOUS GE-SE THIN-FILMS
    MOLNAR, BJ
    DOVE, DB
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1974, 16 (02) : 149 - 160
  • [9] PHOTOINDUCED MASS TRANSPORT IN Ge-Se AMORPHOUS FILMS
    Reinfelde, M.
    Mitkova, M.
    Nichol, T.
    Ivanova, Z. G.
    Teteris, J.
    CHALCOGENIDE LETTERS, 2018, 15 (01): : 35 - 43
  • [10] INVESTIGATION ON EVAPORATED GE-SE LAYERS AS RESISTS FOR MICROLITHOGRAPHY
    THOMAS, A
    KLUGE, G
    SUPTITZ, P
    JOURNAL OF INFORMATION RECORDING MATERIALS, 1988, 16 (04): : 265 - 273