Characteristics of chiral plasma plumes generated in the absence of external magnetic field

被引:17
|
作者
Nie, LanLan [1 ]
Liu, FengWu [1 ]
Zhou, XinCai [2 ]
Lu, XinPei [1 ,3 ]
Xian, YuBin [1 ]
机构
[1] Huazhong Univ Sci & Technol, State Key Lab Adv Electromagnet Engn & Technol, Wuhan 430074, Hubei, Peoples R China
[2] Jinan Univ, Baoan Maternal & Child Hlth Hosp, Dept Stomatol, Shenzhen 518106, Guangdong, Peoples R China
[3] Shanghai Jiao Tong Univ, IFSA Collaborat Innovat Ctr, Shanghai 200240, Peoples R China
基金
中国国家自然科学基金;
关键词
PROPAGATION; DEPOSITION;
D O I
10.1063/1.5016444
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A chiral plasma plume has recently been generated inside a dielectric tube without the use of an external magnetic field. In this paper, we seek to further study the key properties of such a chiral plume to improve our understanding of how this interesting structure is generated and controlled. The chiral plume is generated by externally mounting a stainless steel helical coil or a ring onto the dielectric tube. By changing the pitch of the helical coil, the pitch of the plasma plume can be controlled, with the shape of the plume following the shape of the helical coil. The addition of the helical coil significantly expands the range of parameters under which the chiral plasma plume appears. When the frequency of the applied voltage increases, additional stable discharge channels appear between the adjacent helices. The addition of two helical coils results in the formation of two chiral plasma plumes, which follow the shape of the helical coils. When a metal ring is placed on the outside of the tube, there is no chiral plasma plume between the high voltage electrode and the ring; however, a chiral plasma plume appears on the right side of the ring if the distance between the ring and the high voltage electrode is small. These findings suggest that the chiral plasma can be effectively modulated and guided using an externally mounted helical coil, which acts as the floating/actual ground to reduce the impedance of the discharge and as such contributes to the emergence of the chiral plasma plume behavior. Published by AIP Publishing.
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页数:9
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