Demonstration of High Voltage (15kV) Split-Gate 4H-SiC MOSFETs

被引:4
|
作者
Lynch, Justin [1 ]
Yun, Nick [1 ]
Morgan, Adam J. [1 ]
Sung, Woongje [1 ]
Deckman, Igal [2 ]
Rossman, Dennis [2 ]
Kim, Sung [2 ]
Nguyen, Duy-Son [2 ]
Seo, Jin-Ho [2 ]
Habersat, Daniel [3 ]
Hinojosa, Miguel [3 ]
Green, Ronald [3 ]
Lelis, Aivars [3 ]
机构
[1] State Univ New York Polytech Inst, Albany, NY 12203 USA
[2] Analog Devices Inc, Milpitas, CA 95035 USA
[3] US Army, Res Lab, Adelphi, MD 20783 USA
关键词
Silicon Carbide; Ultra-High Voltage; 15kV; MOSFET; Split Gate; Gate Charge; Switching; T-CAD simulation; Specific On-Resistance; Breakdown Voltage; Edge Termination;
D O I
10.1109/WiPDA49284.2021.9645153
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, 15 kV 4H-SiC Split-Gate Vertical Planar MOSFETs (SG-MOSFET) are demonstrated for the first time. Both the traditional MOSFET and SG-MOSFET were fabricated on the same 6-inch SiC wafer and achieved maximum breakdown voltages (BV) of 15930 V and 15080 V, respectively. This is the first demonstration of the split gate architecture on SiC for voltage ratings above 10 kV, and this BV was achieved using a Hybrid-Junction Termination Extension (JTE) edge termination. The fabricated SG--MOSFETs showed a reduction in gate charge as well as no significant deviation in forward conduction and blocking behavior when compared to their MOSFET counterparts. These results display the SG-MOSFET's potential for lower switching power losses in ultra-high voltage devices without compromising device static performance. In the following text, the layout, static performance, and gate charge of the MOSFET and SG--MOSFET are described to show the exciting potential of the high voltage SG--MOSFET.
引用
收藏
页码:95 / 100
页数:6
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